Resistances for heat and mass transfer through a liquid-vapor interface in a binary mixture

K S Glavatskiy; D Bedeaux

doi:10.1063/1.3518368

Resistances for heat and mass transfer through a liquid-vapor interface in a binary mixture

J Chem Phys. 2010 Dec 21;133(23):234501. doi: 10.1063/1.3518368.

Authors

K S Glavatskiy¹, D Bedeaux

Affiliation

¹ Department of Chemistry, Norwegian University of Science and Technology, NO 7491 Trondheim, Norway.

PMID: 21186869
DOI: 10.1063/1.3518368

Abstract

In this paper we calculate the interfacial resistances to heat and mass transfer through a liquid-vapor interface in a binary mixture. We use two methods, the direct calculation from the actual nonequilibrium solution and integral relations, derived earlier. We verify, that integral relations, being a relatively faster and cheaper method, indeed gives the same results as the direct processing of a nonequilibrium solution. Furthermore we compare the absolute values of the interfacial resistances with the ones obtained from kinetic theory. Matching the diagonal resistances for the binary mixture we find that kinetic theory underestimates the cross coefficients. The heat of transfer is, as a consequence, correspondingly larger.