Comment on, "On the influence of the electron dose-rate on the HRTEM image contrast", by Juri Barthel, Markus Lentzen, Andreas Thust, ULTRAM12246 (2016), http://dx.doi.org/10.1016/j.ultramic.2016.11.016

Affiliations

• ¹ Lawrence Berkeley National Laboratory, The Molecular Foundry, One Cyclotron Road, Berkeley, CA 94720, USA. Electronic address: CFKisielowski@lbl.gov.
• ² Departamento de Física, Instituto Politecnico Nacional ESFM, UPALM-Zacatenco Ed. 9, México CDMX, Mexico.
• ³ Department of Engineering and System Science, National Tsing-Hua University, 101 Kuang-Fu Road, Hsin Chu 300, Taiwan.
• ⁴ Haldor Topsoe A/S, Haldor Topsøes Allé 1, Kgs. Lyngby, DK-2800 Denmark.
• ⁵ Department of Materials Science and Engineering, Center for Electron Microscopy and Analysis (CEMAS), The Ohio State University, 1305 Kinnear Rd, Columbus, OH 43212, USA.
• ⁶ Department of Materials Science & Engineering, University of California-Berkeley, Berkeley, CA 94720, USA.
• ⁷ EMAT, Department of Physics, University of Antwerp, Antwerpen 2020, Belgium.