Complementary Use of Sensitive Nanoscale and Bulk Techniques to Probe Surface and Subsurface Defects in High Volume Manufacturing
Microsc Microanal
.
2023 Jul 22;29(Supplement_1):758.
doi: 10.1093/micmic/ozad067.374.
Authors
Carol A Johnson
1
,
Indra Subedi
1
,
Stephen Exarhos
1
,
Joseph Roth
1
,
Michael Kautzky
1
,
Karen Terry
1
Affiliation
1
Seagate Technology, Bloomington, MNUSA.
PMID:
37613617
DOI:
10.1093/micmic/ozad067.374
No abstract available