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Park J, Nam GJ, Tokmakov IV, Lin MC.Park J, et al. Among authors: lin mc.J Phys Chem A. 2006 Jul 20;110(28):8729-35. doi: 10.1021/jp062413d.J Phys Chem A. 2006.PMID: 16836434
Choi YM, Lin MC.Choi YM, et al. Among authors: lin mc.Chemphyschem. 2004 Feb 20;5(2):225-32. doi: 10.1002/cphc.200300919.Chemphyschem. 2004.PMID: 15038283
Choi YM, Park J, Lin MC.Choi YM, et al. Among authors: lin mc.Chemphyschem. 2004 May 17;5(5):661-8. doi: 10.1002/cphc.200301201.Chemphyschem. 2004.PMID: 15179718
Xu ZF, Park J, Lin MC.Xu ZF, et al. Among authors: lin mc.J Chem Phys. 2004 Apr 8;120(14):6593-9. doi: 10.1063/1.1650832.J Chem Phys. 2004.PMID: 15267551
Choi YM, Park J, Wang L, Lin MC.Choi YM, et al. Among authors: lin mc.Chemphyschem. 2004 Aug 20;5(8):1231-4. doi: 10.1002/cphc.200400087.Chemphyschem. 2004.PMID: 15446748No abstract available.
Zhu RS, Lin MC.Zhu RS, et al. Among authors: lin mc.Chemphyschem. 2004 Dec 10;5(12):1864-70. doi: 10.1002/cphc.200400305.Chemphyschem. 2004.PMID: 15648134
Zhu RS, Lin MC.Zhu RS, et al. Among authors: lin mc.Chemphyschem. 2005 Aug 12;6(8):1514-21. doi: 10.1002/cphc.200400448.Chemphyschem. 2005.PMID: 16082673
Tokmakov IV, Park J, Lin MC.Tokmakov IV, et al. Among authors: lin mc.Chemphyschem. 2005 Oct 14;6(10):2075-85. doi: 10.1002/cphc.200500088.Chemphyschem. 2005.PMID: 16208748
Tokmakov IV, Lin MC.Tokmakov IV, et al. Among authors: lin mc.J Am Chem Soc. 2003 Sep 17;125(37):11397-408. doi: 10.1021/ja0301121.J Am Chem Soc. 2003.PMID: 16220963
Xu ZF, Lin MC.Xu ZF, et al. Among authors: lin mc.J Phys Chem A. 2005 Oct 13;109(40):9054-60. doi: 10.1021/jp0522157.J Phys Chem A. 2005.PMID: 16332011