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Via Method for Lithography Free Contact and Preservation of 2D Materials.
Telford EJ, Benyamini A, Rhodes D, Wang D, Jung Y, Zangiabadi A, Watanabe K, Taniguchi T, Jia S, Barmak K, Pasupathy AN, Dean CR, Hone J. Telford EJ, et al. Among authors: hone j. Nano Lett. 2018 Feb 14;18(2):1416-1420. doi: 10.1021/acs.nanolett.7b05161. Epub 2018 Feb 5. Nano Lett. 2018. PMID: 29385346
Controlled placement of individual carbon nanotubes.
Huang XM, Caldwell R, Huang L, Jun SC, Huang M, Sfeir MY, O'Brien SP, Hone J. Huang XM, et al. Among authors: hone j. Nano Lett. 2005 Jul;5(7):1515-8. doi: 10.1021/nl050886a. Nano Lett. 2005. PMID: 16178267
Boron nitride substrates for high-quality graphene electronics.
Dean CR, Young AF, Meric I, Lee C, Wang L, Sorgenfrei S, Watanabe K, Taniguchi T, Kim P, Shepard KL, Hone J. Dean CR, et al. Among authors: hone j. Nat Nanotechnol. 2010 Oct;5(10):722-6. doi: 10.1038/nnano.2010.172. Epub 2010 Aug 22. Nat Nanotechnol. 2010. PMID: 20729834
340 results