Via Method for Lithography Free Contact and Preservation of 2D Materials.
Telford EJ, Benyamini A, Rhodes D, Wang D, Jung Y, Zangiabadi A, Watanabe K, Taniguchi T, Jia S, Barmak K, Pasupathy AN, Dean CR, Hone J.
Telford EJ, et al. Among authors: watanabe k.
Nano Lett. 2018 Feb 14;18(2):1416-1420. doi: 10.1021/acs.nanolett.7b05161. Epub 2018 Feb 5.
Nano Lett. 2018.
PMID: 29385346