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MoS2 transistors with 1-nanometer gate lengths.
Desai SB, Madhvapathy SR, Sachid AB, Llinas JP, Wang Q, Ahn GH, Pitner G, Kim MJ, Bokor J, Hu C, Wong HP, Javey A. Desai SB, et al. Among authors: wang q. Science. 2016 Oct 7;354(6308):99-102. doi: 10.1126/science.aah4698. Epub 2016 Oct 6. Science. 2016. PMID: 27846499
Engineering High- k/SiGe Interface with ALD Oxide for Selective GeO x Reduction.
Kavrik MS, Ercius P, Cheung J, Tang K, Wang Q, Fruhberger B, Kim M, Taur Y, McIntyre PC, Kummel AC. Kavrik MS, et al. Among authors: wang q. ACS Appl Mater Interfaces. 2019 Apr 24;11(16):15111-15121. doi: 10.1021/acsami.8b22362. Epub 2019 Apr 15. ACS Appl Mater Interfaces. 2019. PMID: 30938163
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