We use Dip-Pen Nanolithography (DPN) to generate monolayer surface templates for guiding pattern formation in spin-coated polymer blend films. We study template-directed pattern formation in blends of polystyrene/poly(2-vinylpyridine) (PS/P2VP) as well as blends of PS and the semiconducting conjugated polymer poly(3-hexylthiophene) (P3HT). We show that acid-terminated monolayers can be used to template pattern formation in PS/P3HT blends, while hydrophobic monolayers can be used to template pattern formation in PS/P2VP blends. In both blends, the polymer patterns comprise laterally-phase separated regions surrounded by vertically separated bilayers. We hypothesize that the observed patterns are formed by template-induced dewetting of the bottom layer of a polymer bilayer during the spin-coating process. We compare the effects of template feature size and spacing on the resulting polymer patterns with predictions from published models of template-directed dewetting in thin films and find the data in good agreement. For both blends we observe that a minimum feature size is required to nucleate dewetting/phase separation. We find this minimum template diameter to be approximately 180 nm in 50/50 PS/P2VP blends, and approximately 100 nm in 50/50 PS/P3HT blends. For larger template diameters, PS/P2VP blends show evidence for pattern formation beginning at the template boundaries, while PS/P3HT blends rupture randomly across the template features.