Study of the adsorption reactions of thiophene on Cu(I)/HY-Al2O3 by Fourier transform infrared and temperature-programmed desorption: adsorption, desorption, and sorbent regeneration mechanisms

Xiao-Lin Tang; Li Shi

doi:10.1021/la2025654

Study of the adsorption reactions of thiophene on Cu(I)/HY-Al2O3 by Fourier transform infrared and temperature-programmed desorption: adsorption, desorption, and sorbent regeneration mechanisms

Langmuir. 2011 Oct 4;27(19):11999-2007. doi: 10.1021/la2025654. Epub 2011 Sep 12.

Authors

Xiao-Lin Tang¹, Li Shi

Affiliation

¹ The State Key Laboratory of Chemical Engineering, East China University of Science and Technology, Shanghai 200237, People's Republic of China.

PMID: 21870798
DOI: 10.1021/la2025654

Abstract

This work mainly involved the investigation of the adsorption of thiophene on Cu(I)-supported HY-Al(2)O(3). It demonstrated a high sulfur capacity of 10 mg sulfur/g sorbent when the HY/Al(2)O(3) mass ratio was 3, loaded with 12% copper, calcined at 550 °C, and tested at ambient temperature. In situ Fourier transform infrared (FTIR) and temperature-programmed desorption (TPD) results indicated that the adsorption mechanisms on Cu(I)/HY-Al(2)O(3) primarily were π-complexation and sulfur-adsorbent (S-M; σ) bonds. Pyridine-FTIR showed the total weak Lewis acid contribution to the Cu(I)/HY-Al(2)O(3) adsorption desulfurization performance.

MeSH terms

Adsorption
Aluminum Oxide / chemistry*
Copper / chemistry*
Spectroscopy, Fourier Transform Infrared
Surface Properties
Temperature*
Thiophenes / chemistry*
Time Factors
Zeolites / chemistry*

Substances

Thiophenes
Zeolites
Copper
Aluminum Oxide